ParkSystems launches revolutionaryNX-3DMThe fully automatic atomic force microscope system is designed specifically for measuring vertical profiles, high-resolution sidewall imaging, and critical angles. With the help of uniqueXYAxis andZAxis independent scanning system and tilt typeZAxis scanner,NX-3DMSuccessfully overcome the challenges posed by normal and horn shaped heads in precise sidewall analysis. existTrue Non-Contact ™In the mode,XE-3DM

It can achieve non-destructive measurement of soft photoresist with high aspect ratio tips.The accuracy and high throughput of nanoscale measurements require cost-effective solutions to expand from research fields to practical production applications. Faced with this cost challenge,Park SystemsBringing industrial grade atomic force microscopy solutions, making automated measurements faster and more efficient, and making probes more durable! We have abandoned slow and expensive scanning electron microscopes and instead adopted efficient, automated, and affordable ones3DAtomic force microscopy further reduces the measurement cost of online industrial manufacturing. Nowadays, manufacturers need3D2Information is used to represent the contour of the groove and the deformation characteristics of the sidewall, in order to accurately identify defects in the new design. The modular atomic force microscope platform enables rapid software and hardware replacement, making upgrades more cost-effective and continuously optimizing complex and demanding production quality control measurements. In addition, the lifespan of our atomic force microscope probes has been extended by at leastDoubling, further reducing purchasing costs. Traditional atomic force microscopes use tapping scanning, which makes the probe more prone to wear, while ourTrue

Non-Contact ™

humidity

30%~60%major functionAn innovative approach

3Dmeasuring method

Side cut and outward profile; Critical size;

Measurement of sidewall roughness

The lowest noise in the industrial sector

Static elimination system ensures a stable scanning environment

Automatic measurement control to improve efficiency

applicationCritical dimensions and sidewall measurementsACross section of photoresist dense linesSEMimage;BThree dimensionalAFMimage;CTemplate