cleaning-scheme

idea

The Importance of Cleaning Process

In the manufacturing industry, achieving high quality, high throughput, high output, and low inventory in production is very important.

With the growing popularity of Internet, communication technology and information processing technology, especially for semiconductor manufacturing equipment, the importance of cleaning process is self-evident.

The cleaning process is crucial in enhancing the value of the customer's enterprise.

2. Hitachi's high-tech cleaning solution

Exclude foreign particles and pollutants
For many years, our company has been committed to the production and manufacturing of semiconductor manufacturing equipment, precision analytical instruments, and more.

Analysis of foreign particles and pollutants
Many customers are using our company's electron microscopes, various analysis devices, and foreign object inspection equipment.

Remove foreign particles and pollutants
Our company has provided many customers with cleaning systems including WET/DRY cleaning technology and environmental control technology.

On the basis of this technology and experience, combined with technical cooperation with partners and digital technology
Hitachi High Tech is committed to providing the best solutions for customers' cleaning problems.

3. Create value through cooperation with customers in the cleaning process

It is important to accumulate skills and experience in one's own company. But not all technologies need to be established within one's own company.

We respond to market demands with the fastest speed and competitive prices.

Working with customers to solve cleaning problems is exactly the philosophy of Hitachi High Tech.

Customer Support System

DRY cleaning technology

Quality Science CleanLogix Technology

Our company's goal is to solve customers' cleaning problems with low environmental load DRY cleaning technology as the core.

Cleaning Examples in CMOS Lens Assembly Process

③ Countermeasures

④ Automation (Example)

CO2 particle cleaning technology

Quality Science CleanLogix Technology

Cleaning principle

Cleaning Example

oil-based

Lens (fingerprint, oil-based ink)

CMOS sensor pixel part (organic matter)

Specially

Using CO2 particle size control technology to generate optimal particles (0.5-500 μ m)

• Spray CO2 particles onto the object to be cleaned using auxiliary gases such as clean dry air
• Heating auxiliary gas can prevent condensation, and particles can achieve low damage cleaning
• The special nozzle structure can achieve high cleaning power and low CO2 loss
• Compared to using water and medication for cleaning, it is more environmentally friendly
  (CO2 is a resource regenerated from exhaust gas)

Main patents

US7225819B2/US6656017B2/US6802961B2/US7601112B2/US7901540B2/US8021489B2/US5725154A/US7451941B2/US9381574B1/US9352355B1/ US9387511B1/US8197603B2/US6979362B2/TWI577452B

Plasma cleaning technology

Quality Science CleanLogix Technology

The precision surface treatment technology using plasma is constantly evolving.

The main reactions that occur during plasma treatment

Feature

1. Realize micro cleaning that cannot be achieved by humidification cleaning
2. Independent ICP technology can generate a wide range and high concentration of plasma
3. Rich plasma types can be used for various purposes

CCP: Capacitive Coupled Plasma
ICP: Inductively Coupled Plasma

The purpose and effectiveness of plasma devices

• Can remove resin residue generated during the processing of micro holes with a diameter of 100-20 μ m
• Can be used for cleaning of 5G new material substrates such as "LCP", "PFA", "PTFE" before bonding and painting treatment
  And the adhesion improvement of the substrate after cleaning before painting treatment
• Shorten the time required for the degassing process of vacuum parts

LCP: Liquid Crystal Polymer
PFA: PerFluoroAlkoxy
PTFE: PolyTetraFluoroEthylene

Device series

Applicable examples

<Example of Organic Matter Removal>

Vacuum plasma ABF material (CF4+O2 gas)

Vacuum plasma fingerprint sensor Descum (CF4+O2 gas)

<Surface Improvement Example>

Atmospheric pressure plasma (used for CDA)