Regulus series ultra-high resolution field emission scanning electron microscope
The existing models SU8240, SU8230, SU8220, and SU8010 have been reorganized to form Regulus 8240, Regulus 8230, Regulus 8220, and Regulus 8100.
The 'Regulus series' inherits the observation and analysis performance of existing models, equipped with the low-noise cold field emission electron gun of the SU8200 series*1It can obtain a highly stable beam current.
By optimizing the electronic optical system, the resolution of Regulus 8240/8230/8220 was increased to 0.7 nm under 1 kV conditions, and the resolution of Regulus 8100 was increased to 0.8 nm.
In addition, to fully utilize the ultra-high resolution capability, the magnification has also been increased from 1 million times in the past to 2 million times*1.
Regulus 8240/8230/8220/8100 also has improved user support functions, which make it easier for users to understand the detection principles of various complex signals and help them fully utilize the optimal performance of the instrument.
- *1
- Regulus 8240/8230/8220 only
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characteristic
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specifications
characteristic
- Using the 'SU8200 series' cold field emission electron gun*2
- Using the high brightness stable region that appears after flashing with an electron beam as the stable observation interval, the optimal performance of high-resolution observation and analysis is achieved under low acceleration voltage conditions
(Regulus8240/8230/8220: 0.7 nm/1 kV、Regulus8100: 0.8 nm/1 kV) - Adopting a low pollution, high vacuum sample chamber
- By using an energy filter (optional), multiple component contrasts can be observed*2
High resolution observation under extremely low landing voltage
Sample: Gold particles
Landing voltage: 10 V
Ultra-high resolution observation
Sample: Pt catalyst
Acceleration voltage: 30 kV
High resolution EDX analysis under low acceleration voltage
Sample: Sn ball
Landing voltage: 1.5 kV
- *2
- Regulus 8240/8230/8220 only
specifications
project | Regulus 8100 | Regulus 8220 | Regulus 8230 | Regulus 8240 | |||
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Secondary electronic resolution | 0.7 nm (Acceleration voltage 15 kV) 0.8 nm (Landing voltage 1 kV)*3 |
0.6 nm (acceleration voltage 15 kV) 0.7 nm (landing voltage 1 kV)*3 |
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Landing voltage | 0.1~2 kV | 0.01~20 kV | |||||
Magnification factor | 20-1000000 times*4 | 20 to 2000000 times*4 | |||||
sample stage | Sample stage control | 3-axis motor platform (optional 5-axis motor platform) | 5-axis motor drive | ||||
moving range | X | 0~50 mm | 0~50 mm | 0~110 mm | 0~110 mm | ||
Y | 0~50 mm | 0~50 mm | 0~110 mm | 0~80 mm | |||
R | 360° | ||||||
T | -5~70° | ||||||
Z | 1.5~30 mm | 1.5~40 mm | |||||
reproducibility | - | - | - | Within ± 0.5 µ m, including ± 0.5 µ m |
- *3
- Observation in deceleration mode
- *4
- Magnification based on 127mm × 95mm film
Related product classification
- Focused Ion Beam System (FIB/FIB-SEM)
- TEM/SEM Sample Preparation Device