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Plasma emission gas chromatography system
When gas passes through a high-frequency and high-intensity electromagnetic field, it is broken down and discharged. Discharge generates a large numbe
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Plasma emission detector(PED):

1.Detector construction diagram

The ionization chamber material is a quartz cell, and high-frequency and high-intensity electromagnetic fields are applied at both ends of the quartz cell. The carrier gas carries the components separated by the chromatographic column into the quartz cell, and under the action of high-pressure and high-intensity electromagnetic fields, the carrier gas and components are ionized together to form plasma.

Different components emit light radiation of different wavelengths in plasma, which is filtered and converted into chromatographic signals through photoelectric conversion. The signals are proportional to the content of gas standard substance components.

2.Detector principle

When gas passes through a high-frequency and high-intensity electromagnetic field, it is broken down and discharged. Discharge generates a large number of electrons and ions. Under the action of an electric field, electrons obtain energy from the electric field and collide with surrounding atoms and molecules to transfer energy, which excites ionization and produces an electron avalanche. When some high-energy electrons pass through conductive channels in an avalanche, some excited state atoms and molecules will spontaneously emit. We obtain signals through these radiations.

3.Detector characteristics

1)High sensitivity (PPb level)

2)High practicality (universal detector)

3)High stability (the substance does not directly contact the electrode)

4)Solving the difficulties of other detectors (neon detection, oxygen argon separation)

5)Main peak shielding

TECHNICAL INDEX

1.Detection limit(ppb):

group divide

H2

O2

N2

CH4

CO

CO2

Ne

ArCarrier gas detection limit

20

20

20

20

20

20

20

HeCarrier gas detection limit

0.5

0.5

0.5

0.5

1

0.5

1

2.Temperature control parameters:

Temperature Control Range

At room temperature8℃-400℃

precision

±0.1℃

TPD

8steps

Program heating rate

1℃~40℃

Automatic rear door opening

have

Cooling rate

7Within minutes(350℃arrive50℃

3. Size, weight, power supply

size

wide655mm×tall500mm×deep480mm

weight

48kg

power supply

220V±22V50Hz

power

≥2kW

System configuration:

1GC-9560gas chromatograph

2)Plasma emission detector(PED

3)Central cutting system

4)Multi column box system

5)Purifier

6)Standard gas

7)Chromatographic column

8)Special pressure reducing valve for carrier gas

9)Non dead volume dedicated sampling valve

10GC-9560V4.0Version anti control chromatography workstation

11VCRjoint(Optional)

12O2Arseparation system(Optional)

13)Electronic gas sampling system(Optional);

Applicable but not limited to the following national standards:

1)High purity gas standard

GB/T3634.2-2011Pure Hydrogen, High Purity Hydrogen, and Ultra Pure HydrogenGB/T 14599-2008Pure Oxygen, High Purity Oxygen, and Ultra Pure Oxygen

GB/T 8979-2008Pure Nitrogen, High Purity Nitrogen, and Ultra Pure NitrogenGB/T 4842-2017Argon

GB/T 4844-2011Pure Helium, High Purity Helium, and Ultra Pure HeliumGB/T 17873-2014Pure Neon and High Purity Neon

GB/T 5829-2006Krypton "GB/T 5828-2006Xenon gas

GB/T 33102-2016Pure and high-purity methane

GB 1886 228-2016National Food Standards food additives Liquid Carbon Dioxide

GB/T 23938-2009High purity carbon dioxide

GB/T28125.1-2011Determination of Hazardous Substances in Air Separation Processes

2)Electronic gas standards

GB/T 16942Gas for Electronic Industry HydrogenGB/T 16943-2009Gas for Electronic Industry Helium

GB/T 16944Gas for Electronic Industry NitrogenGB/T 16945-2009Gas for Electronic Industry Argon

GB/T 14604Gas for Electronic Industry OxygenGB/T 14600-2009Gas for Electronic Industry Argon Nitrogen Oxide

GB/T 14601Gas for Electronic Industry AmmoniaGB/T18867-2014Gas for Electronic Industry Sulfur Hexafluoride

GB/T 15909Gas for Electronic Industry SilaneGB/T 21287-2007Gas for Electronic Industry Nitrogen Trifluoride

Oxygen argon separation technology:

Due to the similar properties of oxygen and argon, the separation of oxygen and argon has always been a difficult problem in chromatographic separation. After years of research, Huaai Chromatography has used a new separation system to achieve the quantitative separation of oxygen and argon.

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