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Calibration standard sample
High Resolution Calibration Standards: Overview
Applied Nanotools provides calibration standards for X-ray, EUV, and visible light microscopes for the highest resolution applications. These high-quality optical components include various calibration elements, which can be seen in the following SEM images:
ANT Design
The ANT calibration standard is designed for the highest resolution requirements of X-ray imaging systems with nanoscale features. Suitable for soft X-ray and hard X-ray mechanisms as well as optical settings.
Nested Ls
Nested Ls or bends allow for high-resolution measurements, ensuring spacing and efficiency. Under high-resolution standards, the spacing is as low as 15 nm half spacing.
Siemen star
This pattern allows for calibration and accurate comparison of the optical resolution of X-rays with other imaging methods.
NanoUSAF 1951
Customized design of Applied Nanotool NanoUSAF 1951 based on USAF 1951 design, but with nanometer rather than micrometer featuresPrice list
| Device | Base Price |
|
Ultra-High Resolution Soft X-Ray Calibration Standard (70 nm Au)
(15 nm half pitch) |
USD $5000 |
|
Soft X-Ray Calibration Standard (200 nm Au)
(20 nm half pitch or better) |
USD $4500 |
|
Hard X-Ray Calibration Standard (>600 nm Au)
(25 nm half-pitch or better) |
USD $6000 |
| Features Include: • Nested L’s • Siemen star patterns (large and small) • Varying pitch gratings and meshe • Nano USAF 1951 |
|
| Customization | Extra Fee |
| • Custom Logo (Max 50 µm2area) | $1000 |
| • Low stress 50 nm silicon nitride membrane | $2000 |
| • Low stress 100 nm silicon carbide membrane | $2500 |
| • Fused Silica Substrate (~500 um thick) Chrome metal on glass (positive tone-only) |
$2500 |
|
Negative polarity (features transparent) • 30 nm minimum feature size (soft X-ray) • 50 nm minimum feature size (hard X-ray) |
$1250 |
| • Custom chip sizes | Contact us |
Customized film/substrate
The calibration standard is manufactured on a sturdy low stress silicon nitride film on a standard 5 mm x 5 mm frame. The fused silica substrate can be used for optical microscopes with chromium characteristics.
The calibration standard is manufactured on a sturdy low stress silicon nitride film on a standard 5 mm x 5 mm frame.
Fused silica substrate can be used for optical microscope with chromium characteristicscustom design
Customized design can add facility logos with high-resolution functionality (recommended minimum component size is 50 nm). Graphics must be provided in GDSII, EPS, or vector format for optimal resolution. If you need assistance with logo submission, please contact us.
High resolution ANT logo, 20 nanometer features, electroplated to 200 nanometersentire allocation
Note: The final design may not be entirely as shown in the diagram.
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